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 Etching 
Process in which a surface, in most cases of a metal, is cleaned by removing surface oxide or passive films. Etching can either be accomplished by dipping into an acid or alkaline solution or by plasma treatment (“plasma etching”) in an appropriate process gas. Examples for the application of etching processes are silicon, SiO2 and Si4N3 in microelectronics as well as metals with surface oxide and nonadherent polymers such as PTFE.

   
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